Plasma enhanced chemical vapor processing system using hollow cathode effect
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1992
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Blum, J. M., Bumble, B., Chan, K. K., Conde, J. R., Cuomo, J. J., & Kane, W. F. (1992). Plasma enhanced chemical vapor processing system using hollow cathode effect. U.S. Patent No. 5,133,986. Washington, DC: U.S. Patent and Trademark Office.
