Statistics for Depth-resolved detection and process dependence of traps at ultrathin plasma-oxidized and deposited SiO2/Si interfaces
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| Depth-resolved detection and process dependence of traps at ultrathin plasma-oxidized and deposited SiO2/Si interfaces | 0 |
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| Lucovsky_2000_Journal_Vac_Sci_Tech_B_1737.pdf | 23 |
