Statistics for Selective Chemical Vapor Deposition of Heavily Boron Doped Silicon-Germanium Films from Disilane, Germane and Chlorine for Source/ Drain Junctions of Nanoscale CMOS
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| Selective Chemical Vapor Deposition of Heavily Boron Doped Silicon-Germanium Films from Disilane, Germane and Chlorine for Source/ Drain Junctions of Nanoscale CMOS | 15 |
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| etd.pdf | 209 |
